Abstract
AbstractThe diffusion of K and I atoms from 5 M water solution of KI into polypropylene implanted with 150 keV F+ and I+ was studied at boiling temperature. Standard Rutherford back scattering (RSB) technique was used for the determination of concentration depth profiles of diffused atoms. It was found that the I and K atoms penetrate the polymer surface layer affected by ion implantation and they are captured by trapping centers produced by electronic energy losses of implanted ions. The uptake of K atoms is several times higher than that of I atoms, and the relative K concentration exceeds the KI stoichiometric value. © 1995 John Wiley & Sons, Inc.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
