Annealing temperature dependence of contact resistance and stability for Ti/Al/Pt/Au ohmic contacts to bulk n-ZnO

K Ip,J.M Zavada,S.J Pearton,F Ren,B Luo,D.P Norton,J.R Laroche,Y.W Heo,K.H Baik

doi:10.1109/iscs.2003.1239937

Annealing temperature dependence of contact resistance and stability for Ti/Al/Pt/Au ohmic contacts to bulk n-ZnO

K Ip, J.M Zavada + Show 7 more

https://doi.org/10.1109/iscs.2003.1239937

Copy DOI

Publication Date: Oct 27, 2003

Affiliation: University of Florida, United States Army Research Office

#Temperature Dependence Of Contact Resistance #Bulk ZnO Substrates + Show 8 more

Abstract
Full-Text
Similar Papers

Abstract

Summary form only given. The authors report on the annealing temperature dependence of contact resistance and morphology for Ti/Al/Pt/Au contacts on high-quality, undoped (n/spl sim/10/sup 17/ cm/sup -3/) bulk ZnO substrates. Two different surface cleaning procedures were employed, although it was found that in general the as-received surface produced the lowest specific contact resistances.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Similar Papers

Paper Title

Journal

Date

Author

View more papers

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.