Abstract
ZnO thin films have been grown on the sapphire (с-Al2O3) substrates at the temperature of 250°C by means of the direct current (DC) magnetron sputtering technique. The crystal structure and surface morphology of the deposited films were investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM). The optical transmission, reflection and luminescence spectra at 300K were analyzed for both the as-grown and post-annealed ZnO films. Using the λ-modulation method gives the possibility to reveal the main features of the energy band structure and the nature of the radiative transitions causing the ultraviolet (UV) luminescence.
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