Abstract
We have investigated the effect of annealing temperature on the structural morphology of ZnO thin films deposited on SiO 2 substrate by the RF magnetron sputtering method. We have used X-ray diffraction, scanning electron microscopy, and atomic force microscopy and have revealed that the grain size and surface roughness tends to increase and the c-axis orientation of ZnO thin film is enhanced by increasing the annealing temperature.
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