Abstract
a-plane GaN templates and coalesced epitaxial lateral overgrown (ELOG) films on r-plane sapphire substrates were investigated by x-ray diffraction (XRD). The a-plane GaN templates were found to have [0001]-oriented stripe-features, which is related to anisotropic mosaicity. For the mosaic blocks, the mosaicity reached the largest and the smallest values along the [11̄00] and the [0001] directions. The ELOG procedure with the SiO2 mask stripes perpendicular to the [0001] direction limits the preferable growth along this direction, and thereby enhances the [11̄00] growth. This leads to large-area, featureless, a-plane GaN films for which the wing tilt and not the fine mosaic block size becomes the major XRD line-broadening mechanism.
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