Abstract
Amorphous carbon thin films were fabricated on a SiO2 substrate using a chemical vapor deposition (CVD) technique. The structural and surface morphology of the films were analyzed by Raman spectrometry and high resolution transmission electron microscopy (HRTEM), respectively. The atomic ratio % of C(sp2) and C(sp3) bonds was estimated using x-ray photoelectron spectroscopy (XPS). The film shows angular magnetoresistance (MR) of 18% and 1.6% at 2 K and room temperature respectively. The mechanism of this angular MR was discussed by use of a grain boundary scattering (GBS) model.
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