Abstract
Analytical noise formulations and design optimization of single- and dual-band inductively source-degenerated MOS low-noise amplifiers (LNAs) with the substrate and metal loss effects of on-chip inductors are established in this paper. It reveals that the noise figures of both single-/dual-band LNAs degrade substantially under the consideration of the loss effects. However, by increasing the device size, the noise optimization methodology of simultaneous noise and input match for a single-band LNA still holds true with concern for the loss effects. For a dual-band LNA, analytical noise optimization for a balanced noise design is established for inductors with metal and substrate loss and indicates a larger device size. The substrate and metal loss effects of inductors can be mitigated using integrated passive device (IPD) process for the input match network. The demonstrated single-band 0.18- $\mu \text{m}$ MOS LNAs with and without IPD process show noise figures of 1.53 and 2.52 dB at 2.4 GHz, respectively. Subsequently, the implemented dual-band 0.18- $\mu \text{m}$ MOS LNAs with and without IPD process show noise figures of 1.6/2.6 and 3.25/4.1 dB at 2.4/5 GHz, respectively.
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