Abstract
An energy-dispersive X-ray analysis of Ti1−xNx films was performed by using an Si(Li) detector. The Ti1−xNx films were sputtered on polished steel substrates in a mixed Ar+N2 atmosphere by a reactive magnetron sputtering technique. Because the nitrogen X-ray line is absorbed by the Be window, an analysis method was developed based solely on the calibration of the characteristic Ti-Kα-intensities using a high-purity Ti standard. The film compositions were computed by means of a ZAF procedure. The samples closest to stoichiometric composition show maximum hardness.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
