Abstract
Printability of side-lobes adjacent to sub-half-micron contact holes defined using an attenuated phase-shift mask at i-line exposure is investigated by practical experiment and computer simulation. Results show that, when printed at nominal size and best focus, side-lobes are present at 0.35 μm but reduce as contact hole size increases and are only printed out-of-focus at 0.4 μm resolution.
Full Text
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call