Analysis of nanopatterning through near field effects with femtosecond and nanosecond lasers on semiconducting and metallic targets

Abstract

A systematic study was conducted to understand the size and shape of nanopatterns generated on selected semiconducting (Si and Ge) and metallic (Cr, Cu, and Ag) targets under different laser pulse durations, laser energies, and number of laser pulses. Based on the experimental results, femtosecond laser pulses, compared with nanosecond laser pulses, provide lower damage thresholds to the targets but higher damage thresholds to the near field scanning optical microscope (NSOM) probes at the wavelength (∼400–410 nm) studied. Furthermore, the resulting nanopatterns showed a significant dependence on the optical properties (i.e., absorption coefficient and surface reflectivity) of the target material. By comparing the obtained experimental results, we conclude that the optical energy transport from the NSOM probe to the target dominates the pattern generation when femtosecond laser is applied to the NSOM system. When nanosecond laser is applied, both the thermal and optical energy transported from the NSOM probe to the targets attribute to the obtained morphology of nanopatterns on different targets under the experimental conditions studied.