Analysis of floating body effects in thin film SOI MOSFETs using the GIDL current technique

M.V. Dunga,A. Kumar,V. Ramgopal Rao

doi:10.1109/ipfa.2001.941497

Analysis of floating body effects in thin film SOI MOSFETs using the GIDL current technique

M.V. Dunga, A. Kumar + Show 1 more

https://doi.org/10.1109/ipfa.2001.941497

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Publication Date: Jul 9, 2001

Citations: 8

Affiliation: Indian Institute of Technology Bombay

#Lateral Asymmetric Channel #Gate-induced-drain-leakage + Show 8 more

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Abstract

In this paper, we present an analysis of floating body effects in lateral asymmetric channel (LAC) and conventional homogeneously doped channel (uniform) SOI MOSFETs using a novel gate-induced-drain-leakage (GIDL) current technique. The parasitic bipolar current gain /spl beta/ has been experimentally measured for LAC and uniform SOI MOSFETs using the GIDL current technique. The lower parasitic bipolar current gain observed in LAC SOI MOSFETs is explained with the help of 2D device simulations.

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