Analysis of Dislocations in PVT-Grown 6H-SiC through Grazing-Incidence X-Ray Topographic Images and Ray-Tracing Simulation

Abstract

The superior electronic and physical properties of silicon carbide (SiC), such as wide band-gap, high saturated electron velocity, high breakdown electric field strength, and high thermal conductivity, enable successful applications in modern power electronic devices with high power, high frequency, and high temperature operation requirements. [1,2] Therefore, understanding the nature and behavior of different dislocations is of great significance towards crystal quality enhancement. Synchrotron X-ray has been widely adopted for generating topographic images of threading screw dislocations (TSDs) as well as threading edge dislocations (TEDs) and basal plane dislocations (BPDs). Besides, recent study in 4H-SiC revealed the presence of threading mixed dislocations (TMDs) with Burgers vectors nc+ma (where m and n are integers). [3] Since direct TMDs observation methods such as transmission electron microscopy (TEM) and synchrotron white-beam X-ray topography (SWBXT) are not suitable for commercially preferred c-plane-oriented wafers, ray-tracing simulated images of possible dislocation types are compared with X-ray topographs in order to identify the TMDs non-destructively. Except 4H-SiC, ray-tracing simulation has also been proved as an effective approach for dislocation characterization in various materials such as GaN [4], ZnO [5], and AlN [6]. The same principle is implemented in this study for the investigation of dislocations in 6H-SiC wafer.Synchrotron monochromatic beam X-ray topography (SMBXT) analysis was carried out on a PVT grown 6H-SiC wafer for recording its grazing-incidence images of all six different 11-212 reflections (Fig. 1). The distribution of TSDs, TEDs, TMDs, and BPDs are characterized, and the determination of their Burgers vectors is achieved by correlating the simulated results obtained through ray-tracing simulation with real X-ray topographic observations (Fig. 2). This study provides a clear understanding of dislocations in 6H-SiC, which is crucial for quality improvement of the crystal.Reference:[1]: C. Codreanu, et al, Comparison of 3C-SiC, 6H-SiC and 4H-SiC MESFETs Performances, Materials Science in Semiconductor Processing 3 137 (2000).[2]: J. W. Sun, et al, Shockley-Frank Stacking Faults in 6H-SiC, Journal of Applied Physics 111, 113527 (2012).[3]: J. Q. Guo, et al, Direct Determination of Burgers Vectors of Threading MixedDislocations in 4H-SiC Grown by PVT Method, Journal of Electronic Materials 45, 4 (2016).[4]: B. Raghothamachar, et al, X-ray Topography Characterization of Gallium Nitride Substrates for Power Device Applications, submitted for publication.[5]: T. Y. Zhou, “Threading Dislocation Characterization and Stress Mapping Depth Profiling via Ray Tracing Technique,” Ph.D. Thesis, SUNY Stony Brook, Advisor: Michael Dudley (2015).[6]: T. Y. Zhou, et, al, Characterization of Threading Dislocations in PVT-Grown AlN Substrates via x-Ray Topography and Ray Tracing Simulation, Journal of Electronic Materials volume 43, 838 (2014). Figure 1