Abstract
This paper details to an electromagnetic modeling of an extreme ultraviolet (EUV) lithography mask. For that purpose, a modal method based on a spline nodal expansion (MMSNE) is presented. The results obtained using first, and second-order splines as basis functions are compared with those obtained using other modal methods, such as modal method by Fourier expansion (MMFE). The agreement between the results obtained using different methods is very good, and a convergence test is also performed. The spline nodal basis function implemented in this paper is the first step toward the realization of a multiresolution scheme that is expected to perform much more efficiently than conventional schemes.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
