Analog/RF and Power Performance Analysis of an Underlap DG AlGaN/GaN Based High-K Dielectric MOS-HEMT

Abstract

This paper exemplifies an exhaustive, figurative and subjective study on the RF performance and DC characteristics analysis of an Underlapped Double-Gate (U-DG) AlGaN/GaN heterojunction-based MOS-HEMT device with Hafnium-based high-k dielectric gate material. This paper depicts the effect of gate length variations on the drain current (ID), the transconductance (gm), the transconductance generation factor (gm/ID) and the RF FOMs intrinsic capacitances (CGD, CGS and CGG), intrinsic resistances (RGD and RGS), cut-off frequency (fT) and maximum oscillation frequency (fMAX). This study reveals shortening of channel length leading to better gate controllability hence an overall superior analog and RF performance is achieved. The U-DG AlGaN/GaN based MOS-HEMT device of 100 nm channel length shows a better Power Output Efficiency (POE) of 33% in contrast to 31% and 23% for the 200 nm and 300 nm devices respectively.