Abstract
A radio-frequency magnetron sputter was used to deposit a 60 nm TiO[Formula: see text] film on a W-coated Si substrate at room temperature. Subsequently, a 100 nm Ni film was deposited using a thermal evaporator to form a Ni/TiO[Formula: see text]/W structure. Numerous oxygen vacancies and defects were present in the TiO[Formula: see text] film. The current–voltage characteristics indicate that Schottky emission dominated the conduction mechanism of the Ni/TiO[Formula: see text]/W structure. Because of Schottky barrier modulation, analog resistive switching of the Ni/TiO[Formula: see text]/W structure can be performed using consecutive voltage sweepings or voltage pulses. Various pulse waveforms were used to demonstrate synaptic potentiation and depression.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
