Abstract
The isothermal gelation process in silicon alkoxide solutions has been investigated using ultrasonic pulse spectroscopy. The process in alcoholic solutions of monomeric and oligomeric precursors was monitored continuously by changes in ultrasonic longitudinal wave velocity. Under a closed system, the velocity gradually decreased as the gelation advanced. However, in an open system, the velocity slightly increased before decreasing after gelation. In order to understand the cause of these changes in the velocity, the effects of hydrolysis and evaporation of the solvent were studied.
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