Abstract
In a DC sputtering device, which had been successfully tested by sputtering films of high-T c superconducting materials [1], the planar arrangement has been altered to an off-axis one and lateron a planar magnetron target holder (unbalanced) was included into the setup. Nb and NbN-films have been prepared - the latter also by reactively sputtering from an Nb target in a pure N 2 or (Ar + N 2 ) atmosphere, respectively. During the deposition of niobium in the non-magnetron mode we have used Langmuir-probes to investigate the plasma parameters in the sputter discharge.
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