Abstract
The physical and structural evolution of alumina films deposited by ALCVD annealed at high temperatures in N 2 has been studied. Low temperature post deposition treatments in NH 3 (PDN) have been performed to evaluate the impact of nitrogen incorporation in the alumina film on its thermal stability. Thermal evolution has been studied by deep UV spectroscopic ellipsometry and grazing X-ray reflectance techniques. AFM measurements were also performed to confirm and complete the ellipsometric and GXR analysis. The change of the crystalline structure was detected by ellipsometry by the different UV refractive index, while the GXR provided a unique thickness evaluation. It was therefore possible to determine the layer densification after the thermal treatment and the impact of the PDN on the transition temperature.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.