Abstract

We present the design and integration of a nine-pH microsensor array on a single silicon substrate with its own signal readout circuit, integrated in a 0.6-μm commercial standard complementary metal oxide semiconductor (CMOS) process. An ion sensitive field effect transistor (ISFET) has been used as pH microsensor and an instrumentation amplifier as the read-out circuit. The ISFET structure is conformed by the channel length and ratio of MOS transistor, gate extended and the selective membrane, for which silicon nitride (Si3N4) is employed as an ion selective element. The complete design includes shielding around the pH microsensor and the readout circuit to avoid leakage of current to the substrate. The readout circuit is composed by three operational amplifiers and resistances that form the instrumentation amplifier, with a ±2.5 V bias has a 50 dB gain, power supply rejection ratio (PSSR) of 120 dB and common mode rejection ratio (CMRR) of 127 dB. The complete system is integrated in a 1.12 mm2 silicon area; it presents a 59 mV/pH linearity, within a concentration range of 2 to 12 of pH level, making it a good alternative for biological or medical applications.

Highlights

  • The ion sensitive field effect transistor (ISFET) has been used as pH sensor during the last years; they can detect chemical and biological phenomena or even can be used for biosensing [1,2,3,4,5,6,7,8]

  • We propose the integration of 9 pH microsensors, implemented with ISFET’s, all of them have their own readout circuit associated

  • This paper is organized as follows: in Section 2, we describe both ISFET pH microsensor and readout circuit formed by an instrumentation amplifier and analog amplifier

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Summary

Introduction

The ion sensitive field effect transistor (ISFET) has been used as pH sensor during the last years; they can detect chemical and biological phenomena or even can be used for biosensing [1,2,3,4,5,6,7,8]. Variations that exist in the ISFET selectivity depend on the selective membrane employed, the most used materials are: Al2O3, Si3N4, SiO2, TaO5, ZrO2, SnO2/Al; other kind of materials like polymers, metallic oxides and organic/inorganic materials [19,20,21,22,23,24,25,26,27] are used for this purpose. These materials are widely used due to its high selectivity with the hydrogen ions. ISFET structure is different to the conventional FET structure due to an exterior exposed window that is left inside the sensor structure where the sensitive material will be deposited to form the selective membrane of the hydrogen ions or others [28,29]

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