Abstract

[1] We present results from experiments designed to investigate the interactions between stress-driven melt segregation and reaction-enhanced melt infiltration, two mechanisms that have previously been studied independently of each other. A melt source (with a melt fraction below the rheologically critical melt fraction) in which the basaltic melt is either orthopyroxene-saturated or orthopyroxene-undersaturated was coupled with a nominally melt-free olivine + orthopyroxene sink in two cylindrical configurations deformed in torsion. As melt migrates from the source to the sink in samples with an orthopyroxene-undersaturated melt source, the basalt dissolves orthopyroxene and precipitates olivine. The local increase in melt fraction during this process increases permeability and enhances melt infiltration. As melt migrates from the source to the sink in samples with an orthopyroxene-saturated melt source, the reaction described above does not occur. These samples display modest infiltration associated with combined surface tension-driven flow and mechanical segregation. Our experiments demonstrate (1) that combined reaction and deformation leads to greater infiltration of melt than does either mechanism alone, and (2) that melt segregation associated with deformation is an effective way to create perturbations in melt fraction along the source-sink interface, which act as nucleation points for reaction-enhanced infiltration in the experiments.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.