Abstract

The early growth stages of chemically reduced cobalt on thin Formvar substrates were examined by electron transmission microscopy. The growth characteristics were examined as a function of the average effective thickness and the deposition rate (1 Å/sec. to 6 Å/sec.). The chemical reduction method is essentially a controlled autocatalytic reduction of cobalt ions from solution by hypophosphite ions in the presence of a catalyst (Co, Ni, Pd, Al). Thin Formvar films prepared on a glass base were indirectly catalyzed with palladium by immersion in a stannous chloride solution, rinsing and immersing in a palladium chloride solution.

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