Abstract
Anodic alumina template containing hexagonally ordered nanopores has been widely used over the last decade for the development of numerous functional nanostructures such as nanoscale sensors, computing networks, optoelectronic devices, thin film micro circuits, ultra filtration membranes, keying layers for organic adhesives to hard, wear and corrosion resistant layers and memories. The long range pore order requires the starting aluminum surface to be extremely smooth. Electropolishing is the most commonly used method for surface planarization prior to anodization. While prevalent, this method has several limitations in terms of throughput, polishing area and requirement of special experimental setups. In this work, we report a new treatment called-chemical polishing which offers a viable, simpler, safer and faster alternative to electropolishing
Highlights
The electropolishing system smoothens, polishes, deburrs, cleans and streamlines the microscopic surface of a metal object
Annealing is necessary to improve the homogeneity of the aluminium substrate for well ordered pore growth, by increasing grain size, minimizing grain boundary area which is considered as a defect and eliminating residual stresses obtained as a result of rolling
Chemical polishing was done by the mixture consists of 15 parts of 68% nitric acid and 85 parts of 85% phosphoric acid
Summary
The electropolishing system smoothens, polishes, deburrs, cleans and streamlines the microscopic surface of a metal object. This requires continuous cooling of the electrolyte during polishing Even storage of these electrolytes require special perchloric acid fume hood with self-contained wash-down units to inhibit formation of metallic per sschlorate crystals on the walls of the fume hood and the exhaust ductwork. These crystals are highly unstable and shock-sensitive and may ignite or detonate under certain conditions. There is little reported research on using roughness tester to evaluate the aluminium surface This method has been rarely used in the development of nanostructures even though it allows parallel processing of large number of aluminum substrates with arbitrary areas and not necessarily requires perchloric acid.
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