Abstract
For the establishment of an advanced synchrotron radiation lithography system, it is necessary to develop an x-ray stepper with highly accurate alignment capability. A new version of a vertical stepper called SS-1 has been developed using an air-lubricated xy-stage, an optical heterodyne detection system and a digital software servo alignment control system. It is shown in this paper that the stepper has the capability of achieving an alignment accuracy better than the 3-sigma value of 70 nm and delineating 0.2 μm line and space pattern clearly.
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