Abstract
New photobleachable materials, two kinds of diazonaphthoquinone compounds and a diazonium salt, have been developed for contrast enhanced lithography. These materials are quite soluble in nonpolar solvents and are stable even in solution. Therefore, they can be directly coated on a bottom resist layer and removed without attacking it. Their films have strong absorption bands in the UV region involving g-, h-, and i-lines. They are uniformly bleached by UV exposure. When these materials employ as contrast enhancement layers, 1.0 μm line and space patterns are clearly resolved by using a mirror projection aligner and 0.55 μm line and space patterns are clearly resolved by using an i-line reduction projection aligner.
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