Abstract

Development of highly active and earth-abundant cocatalysts to replace scarce noble-metals is of great importance to realize large-scale and cost-efficient photocatalytic H2 evolution reactions. Herein, we report that amorphous WSx cocatalyst grown on the CdS surface by a facile solution-based photochemical reduction method is an effective alternative for Pt cocatalyst and lead to superior photocatalytic H2 evolution performances. Under visible light irradiation (≥420nm), the optimized CdS/WSx (12%) photocatalyst achieved a high initial H2 evolution rate of 761μmolh−1, which is the 17 times faster than that of CdS alone. Notably, the WSx cocatalyst shows a nearly 5 times higher activity than that of Pt in catalyzing H2 evolution on CdS at same loading amount. An apparent quantum efficiency (AQE) of 14.7% was achieved over CdS/WSx (12%) at 420nm. Moreover, CdS/WSx(12%) photocatalyst is relatively stable for 20h H2 evolution reactions, showing the robustness of WSx cocatalyst. Based on the results of photoelectrochemical and PL measurements, it was proposed that the amorphous WSx not only can rapidly capture photogenerated electrons from excited CdS for enhancing the charge separation efficiency, but also promote the H+ reduction to H2. Considering its high activity, easy-preparation, and low cost, the amorphous WSx cocatalyst would hold great potential in designing high-performance semiconductor/WSx photocatalysts for large-scale H2 production using renewable energy sources.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.