Amorphous In-Ga-Zn-O thin-film transistors fabricated by microcontact printing

Abstract

The authors present a facile, low-cost methodology to fabricate high-performance In-Ga-Zn-O (IGZO) bottom contact, bottom gate thin-film transistors (TFTs) by soft lithography. The IGZO channel and indium tin oxide (ITO) source and drain were patterned using microcontact printing of an octadecylphosphonic acid self-assembled monolayer (SAM). A polymer stamp was used for the pattern transfer of the SAMs, which were then used as a chemical protection layer during wet etching. Excellent pattern transfer was obtained with good resolution and sharp step profiles. X-ray photoelectron spectroscopy indicated that the microcontact printed SAMs can be effectively removed from the ITO source/drain surfaces, allowing a high-quality interface to the IGZO channel for good device performance. Scanning electron microscopy cross-sections of the devices indicate a smooth and defect-free transition regions between the source/drain and semiconductor regions. The fabricated TFTs have negligible gate-leakage currents, high average electron mobilities of 10.2 cm2/Vs, and excellent on-off ratios of 2.1 × 108. These results may provide new methodologies for low-cost and large-area integration of IGZO-TFTs for a range of applications including flexible and transparent displays.