Abstract
Diffusion and reaction of aluminum metal species (Al) vacuum deposited on perylene-3,4,9,10-tetracarboxylic dianhydride (PTCDA) thin films were investigated using angle resolved x-ray photoemission spectroscopy. The acquired data were analyzed assuming that the diffusion of Al is described by a one-dimensional diffusion equation with a time-dependent diffusion coefficient. Depth profiles and diffusion coefficients are obtained for reacted and metallic Al separately. The results show that the metallic Al diffuses rapidly during the deposition while the metal diffusion continues at a lower rate even after the deposition at room temperature. On the other hand, the reacted Al does not diffuse further into the PTCDA layers.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
