Alumina Templates on Silicon Wafers with Hexagonally or Tetragonally Ordered Nanopore Arrays via Soft Lithography

Abstract

E-mail: shin@snu.ac.kr Received October 15, 2011, Accepted November 3, 2011Due to the potential importance and usefulness, usage of highly ordered nanoporous anodized aluminum oxidecan be broadened in industry, when highly ordered anodized aluminum oxide can be placed on a substrate withcontrolled thickness. Here we report a facile route to highly ordered nanoporous alumina with the thickness ofhundreds-of-nanometer on a silicon wafer substrate. Hexagonally or tetragonally ordered nanoporous aluminacould be prepared by way of thermal imprinting, dry etching, and anodization. Adoption of reusable polymersoft molds enabled the control of the thickness of the highly ordered porous alumina. It also increasedreproducibility of imprinting process and reduced the expense for mold production and pattern generation. Asnanoporous alumina templates are mechanically and thermally stable, we expect that the simple and cost-effective fabrication through our method would be highly applicable in electronics industry. Key Words : Imprint lithography, AAO, Self-assembly, Anodization, ElectroplatingIntroductionDuring the recent decades, there has been an extensiverange of study for manufacturing of nanomaterials due to itspotential application to electronics, photonics, informationstorages, or filters.