Al/Ti contacts to Sb-doped p-type ZnO

Abstract

Sb-doped p-type ZnO film was grown on Si (100) substrate by molecular-beam epitaxy. Al/Ti metal was evaporated on the ZnO film to form contacts. As-deposited contacts were Schottky with a barrier height of 0.8 eV. Ohmic conduction was achieved after thermal annealing. The different combinations of Ohmic and Schottky contacts on Sb-doped ZnO layer led to metal-semiconductor-metal (MSM), Schottky, and photoconductive devices. Ohmic contacts on Sb-doped p-type ZnO and backside of n-type Si substrate formed a heterojunction diode. MSM, Schottky, and photoconductor devices exhibited typical electrical characteristics, however, inverted rectification was observed for heterojunction diodes. All devices exhibited ultraviolet (UV) photoresponse. Secondary ion mass spectroscopy measurements were performed on the Ohmic and Schottky contacts on Sb-doped ZnO film to trace the metal profiles before and after annealing. Mechanisms of the formation of Schottky and Ohmic contacts to Sb-doped p-type ZnO and their device operation principles are discussed. This work suggests that Al/Ti can be used as both Ohmic and Schottky contacts to Sb-doped p-type ZnO for UV detection applications.