Abstract
Al-Mo deposits were prepared with alternating sputtering using separate Al and Mo targets. The relative compositions of the binary films were found to be linearly proportional to the Al Mo power ratio. The microstructure, detected with X-ray diffraction, of the as-deposited films were observed to be the Al, Mo and amorphous phases, depending on the relative atomic ratio of Al Mo . Transmission electron microscopy diffraction patterns indicated that the films were not uniform in structure. The crystallization behavior of the amorphous deposits was found to be influenced by the Al Mo atomic ratio of the deposit. A higher Al content lowered the crystallization temperature of the deposits. The as-deposited amorphous films reacted with a Au top layer right upon deposition. However, the conversion of the Al-Mo deposits to a corresponding compound will raise the interaction temperature.
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