Abstract
All-back-contact perovskite solar cells promise greater power conversion efficiency compared to conventional planar device architectures. However, the best-performing devices to date use photolithography to fabricate electrodes, which is expensive for deployment and a barrier for research facilities. Herein, we utilize cracked film lithography, a solution-processed micropatterning technique, to form an interconnected, defect-tolerant back-contact electrode network. We introduce a crack widening technique to control the optical transparency and sheet resistance while decoupling the relative areas of the electron and hole contacts in the back-contact network. Wider cracks increase the area of the hole-selective contact, which increases photocurrent and power conversion efficiency.
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