Abstract
We investigated the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a-C:H thin film as working gas at 30 W rf bias condition. A high pretilt angle by ion beam(IB) exposure on the a-C:H thin film surface was measured. A good LC alignment by the IB alignment method on the a-C:H thin film surface was observed at annealing temperature of 250°C, and the alignment defect was observed above annealing temperature of 300°C.
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