Abstract
A new approach for the wafer-level fabrication of silicon-VLSI-based liquid-crystal (VLSI/LC) microdisplays has been investigated. Fabrication of the LC cell gap is based on the same processes developed for creating ultra low-k dielectrics for VLSI interconnect. A dimensionally precise planar LC cavity is created by use of a sacrificial polymer placeholder in an all build-up process. The process flow for a reflective LC display is presented along with early tests using a polyimide alignment layer.
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