Abstract
A new approach for the wafer-level fabrication of silicon-VLSI-based liquid-crystal (VLSI/LC) microdisplays has been investigated. Fabrication of the LC cell gap is based on the same processes developed for creating ultra low-k dielectrics for VLSI interconnect. A dimensionally precise planar LC cavity is created by use of a sacrificial polymer placeholder in an all build-up process. The process flow for a reflective LC display is presented along with early tests using a polyimide alignment layer.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
