Abstract
Octadecyltrichlorosilane (OTS) Langmuir-Blodgett (LB) film was used as a resist layer for nanofabrication with AFM tips. Features with linewidth of 30nm have been achieved. Threshold forces for lithography were found to be 400nN for OTS monolayer and 800nN for mica substrate respectively. The OTS film is shown to have nice mechanical stability and wearability for AFM lithography.
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