Abstract
Copper(I) oxide thin films have been deposited on glass using a simple single-step chemical vapour deposition method, utilising commercially available Cu(acac)₂ (acac = acetylacetonato) dissolved in toluene and deposited at 350 °C, which when exposed to air on cooling forms a native protective layer of CuO <10 nm thick. These films are demonstrated to be active for photoelectrochemical reduction of carbon dioxide at −0.6 V versus Ag/AgCl, a potential route for conversion of waste CO₂ to useful organic chemicals, and stable to photocorrosion.
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