Abstract
During the past decade, ion implantation systems have evolved from labor-intense, novel machines in the manufacturing environment to automatic, highly productive manufacturing tools. Performance advances have been made in several areas: wafer charging, high-energy operation, BF 2 + dissociation, reliability and automation of the machine and information transfer to the host computer. The changes and improvements in these areas are discussed for the Varian High Current XP Series and the EXTRION 1000 ion implantation systems.
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