Abstract
During the past decade, ion implantation systems have evolved from labor-intense, novel machines in the manufacturing environment to automatic, highly productive manufacturing tools. Performance advances have been made in several areas: wafer charging, high-energy operation, BF 2 + dissociation, reliability and automation of the machine and information transfer to the host computer. The changes and improvements in these areas are discussed for the Varian High Current XP Series and the EXTRION 1000 ion implantation systems.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
