Abstract
UV photoemission spectroscopy (UPS) with He 1 radiation ( hν = 21.2 eV) has been used to study the interaction of H 2O and CH 3OH with GaAs(110) surfaces prepared by cleavage in ultrahigh vacuum (UHV). For H 2O two molecularly adsorbed phases can be distinguished at 300 K: at low coverage H 2O is chemisorbed by its oxygen lone-pair orbital to the surface whereas for higher exposures a less perturbed species which resembles more a “physisorbed” or condensed H 2O layer is found. At 180 K only the less perturbed species can be identified. Also CH 3OH is chemisorbed molecularly at lower coverage with its oxygen end to the GaAs surface. For higher exposures two additional emission bands are observed which are interpreted as due to the methoxy radical CH 3O resulting from a partial decomposition of CH 3OH.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
