Abstract
A praseodymium oxide thin-film was deposited on Ru(0 0 0 1) by vapor depositing Pr in 2 × 10 −7 Torr O 2 while the Ru was at 700 K. The film was approximately 5 nm thick and did not produce a LEED pattern. The adsorption and reaction of CO and C 2H 4 adsorbed on Rh supported on the PrO X film were studied by TPD and SXPS. The CO initially reacted with oxygen in the substrate to produce CO 2. After this oxygen was removed, the CO adsorbed non-dissociatively in a manner similar to what is seen on Rh(1 1 1). C 2H 4 adsorbed on the Rh particles and underwent progressive dehydrogenation to produce H 2 during TPD. The C from the C 2H 4 reacted with the O in PrO X to produce CO. CO dissociation on the Rh particles could be promoted by reducing the PrO X with C 2H 4 before CO exposure. The CO dissociation occurred over a narrow range of Pr reduction and occurred only at high degrees of reduction. No CO dissociation was seen for films with a Pr 3+ content of up to 50%. Extensive treatment in C 2H 4 poisoned subsequent CO adsorption due to the build-up of C on the Rh particles.
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