Abstract
Focused soft X-ray beam induced deposition (FXBID) is a novel technique for direct-write nanofabrication of metallic nanostructures from metal organic precursor gases. It combines the established concepts of focused electron beam induced processing (FEBIP) and X-ray lithography (XRL). The present setup is based on a scanning transmission X-ray microscope (STXM) equipped with a gas flow cell to provide metal organic precursor molecules towards the intended deposition zone. Fundamentals of X-ray microscopy instrumentation and X-ray radiation chemistry relevant for FXBID development are presented in a comprehensive form. Recently published proof-of-concept studies on initial experiments on FXBID nanolithography are reviewed for an overview on current progress and proposed advances of nanofabrication performance. Potential applications and advantages of FXBID are discussed with respect to competing electron/ion based techniques.
Highlights
The present setup is based on a scanning transmission X-ray microscope (STXM) equipped with a gas flow cell to provide metal organic precursor molecules towards the intended deposition zone
Fundamentals of X-ray microscopy instrumentation and X-ray radiation chemistry relevant for Focused soft X-ray beam induced deposition (FXBID) development are presented in a comprehensive form
Several recent studies have demonstrated that focused electron beam induced processing (FEBIP) has high potential for the controlled bottom-up fabrication of metallic 3D nanostructures [1,2,3,4,5,6,7,8,9,10,11,12,13,14]
Summary
Several recent studies have demonstrated that focused electron beam induced processing (FEBIP) has high potential for the controlled bottom-up fabrication of metallic 3D nanostructures [1,2,3,4,5,6,7,8,9,10,11,12,13,14]. The approach is limited to materials with significantly different absorption cross-sections at the chosen incident photon energies, as in transmission geometry, all layers are exposed to the beam at different degrees of focusing. Such experiments open a completely novel perspective for complex direct-write nanofabrication. FXBID exploits the photon energy-selectivity of synchrotron-based XRL and extends it by the idea of depositing metal nanostructures from suitable precursor gases [21,22]. Potential applications of FXBID nanofabrication, with a special focus on porous substrates, are discussed
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