Abstract
Additive manufacturing is the application of layer manufacturing techniques to fabricate microelectronic products. These techniques differentiate themselves from incumbent technologies in that they only add material to build the device and are an alternative to subtractive technologies such as lithography that globally coat layers and then etch-away unrequired materials. In this paper we discuss an additive technology that performs material evaporation through shadow masks. This process has shown significant potential for the fabrication of chip packaging, microelectronic devices and circuitry; specifically, high density interposers, fine conductor lines and embedded components such as capacitors, resistors, and transistors. The process is compatible with a number of both rigid and flexible substrates and deposition materials. Examples of devices and lines that have been manufactured by this technique are shown and discussed. Preliminary test data shows line / space resolution that has reached 15 / 30 microns and better.
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