Abstract
A positive-tone single-layer resist for use with 193-nm radiation has been developed. The system contains a terpolymer of methyl methacrylate, methacrylic acid, and t -butyl methacrylate, along with a photoacid generator. The chemically amplified deprotection of the t -butyl methacrylate into methacrylic acid increases the polarity of the resist and allows selective dissolution in metal-ion-free aqueous-base solutions. The resist sensitivity is less than 10 mJ/cm 2 , and its inherent resolution is better than 0.1 μm. These acrylate-based systems have the potential to be both lower in cost and have better environmental stability than the deep ultraviolet chemically amplified resists that use phenolic resins.
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