Abstract

Substituted poly(cyclohexene)s, used as poly(phenylene) precursors, have been prepared by radical polymerization of cyclohexadiene-1,2-diol derivatives containing various leaving groups. The precursors were converted into poly(phenylene) either by curing at elevated temperatures or by deep-UV exposure in the presence of a photoacid generator. These reactions were investigated by both IR and UV analysis. Our results with the conversion of precursors into poly(phenylene) via photoaromatization suggest that polyphenylene precursors can be imaged by deep-UV microlithography (as a new class of photoimageable thermally stable polymers).

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