Development of New Polymeric Materials for Linear Waveguides

Abstract

AbstractWe have evaluated the use of either poly(phenylene) prepared via spin-coatable polymeric precursors or fluorinated polysilynes for optical waveguides. Poly(phenylene) precursors were converted into poly(phenylene) by either curing at 300 °C or by deep-UV exposure in the presence of a photoacid generator. The poly(phenylene)s have a number of desirable properties for optical waveguide applications including good near IR transmission, low dielectric constant, thermal and environmental stability and ease of pattern fabrication using microlithographic techniques. Copolysilynes were spin-coated onto various types of substrates and then exposed by deep-UV radiation. Upon exposure of deep UV irradiation in the presence of air, they undergo photooxidative crosslinking to give insoluble glass-like materials. This photo-oxidation process is accompanied by a large decrease in refractive index from n=1.61 to n= 1.485. The photooxidation results suggest that their potential applications are as photoresists and optical waveguides.