Abstract

The correction accuracy of the representative figure method is studied. In order to evaluate pattern size deviation using the small area size as a parameter, we carry out a systematic experiment using a 0.2 µ m line-and-space pattern. It is found that the small area size of an element and a reference rectangle can be maximized at 5 µ m and 15 µ m, respectively, to suppress the pattern size deviation below 10%, or 0.02 µ m. The large area sizes obtained here result in the reduction of calculation time for correction. The correction time itself can be reduced to 1/16 of that in our previous work. When a 4 CPU (50 MIPS per CPU) computer is used, the total calculation time can be completed in less than 15 min for a chip of 15×15 mm2 size.

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