Abstract

We report on the incidence of cellular breakdown in silicon wafers implanted with indium and pulsed laser melted at varying laser fluence. We predict from heat flow calculations that as laser fluence is decreased, (a) the melt depth decreases, (b) the solidification velocity increases, and (c) the solidification front should be more stable with respect to cellular breakdown (based on the binary alloy solidification theory), which should result in observed incidence of cellular breakdown at a relatively shallower depth below the surface. However, secondary ion mass spectrometry (SIMS) data show that cellular breakdown at lower fluence is observed deeper, indicating that the interface became unstable earlier in its solidification. The SIMS data show significant In evaporation, with greater evaporation occurring as fluence increases. Calculations show that surface evaporation can reduce the bulk liquid concentration during solidification, reducing the degree of instability. The longer melt durations after irradiation at higher fluence give more time for evaporation, which may result in a relatively larger delay in the onset of breakdown compared to lower fluence by suppressing the bulk liquid concentration and suppressing the growth of unstable perturbation. Under certain conditions, this effect could dominate over the role of reducing the interface speed, which would tend to accelerate amplification of a perturbation, which leads to breakdown. Calculations qualitatively support this interpretation.

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