Abstract
Tungsten carbide films were prepared by rf reactive sputtering of tungsten in argon-methane mixtures. Glass, alumina and rocksalt substrates were used. The deposition rate for pure tungsten was 80 AA/min as the partial pressure of methane was increased four types of x-ray diffraction patterns were obtained for the films these were (I) BCC alpha-W; (II) beta-W/sub 2/C, orthorhombic modification reported to have a stability range between 2100 and 2400/sup 0/C; (III) B-1, assumed to be WC; and (IV) amorphous or fine crystalline structure. The maximum superconducting temperature for the films was 9.0K. 2 refs.
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