Absolute In coverage and bias-dependent STM images of the Si(111)4×1-In surface

Abstract

We report on the absolute measurement of In coverage on the Si(111)4\ifmmode\times\else\texttimes\fi{}1-In surface using medium-energy ion scattering, and present bias-dependent scanning tunneling microscopy (STM) images. The In coverage was determined to be 1 monolayer (ML). This result is in contrast to previous results of 3/4-ML In determined by semidirect measurements using Auger electron spectroscopy and STM. Our result supports a 4\ifmmode\times\else\texttimes\fi{}1-In structural model consisting of four surface In rows, which was constructed from the recent surface x-ray diffraction study and tested by subsequent theoretical calculations. The bias-dependent STM images are well reproduced by ab initio simulations based on this 1-ML-In model.