Abstract
Wavefront matching is a new technique for compensating uncontrollable aberration effects on a certain reticle design which involves moving controllable aberrations. Such a compensation concept is crucial for producing system-on-chip devices using photolithography. A high-precision wavefront monitor is an essential item for the wavefront matching. The resist-based aberration measurement technique based on the three-beam interference theory is a candidate for monitoring. In the present work, the wavefront in the lithography lens was driven by the lens controller, and then the slight change from the initial state was measured using the technique. For the experiment, a krypton fluoride excimer laser scanner with a numerical aperture (NA) of 0.68 was used. The measurement results verified that the technique has sufficient sensitivity to monitor the wavefront matching.
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