Abstract
An atmospheric microwave plasma torch is presented for post-pump destruction of perfluorocompound gases (PFCs), which are used widely in the semiconductor industry and are emitted with nitrogen gas for vacuum pump purges. Discharges of the microwave plasma torch are well suited for abatement of PFC contaminants discharged at a typical flow rate. The abatement was carried out using oxygen or air as additive gases. Analytical results are systematically compared to quadrupole mass spectroscopy and Fourier transform infrared (FTIR) data in the laboratory. Destruction and removal efficiency of more than 99% in FTIR data was achieved for carbon tetrafluoride.
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