Abstract
A versatile system for vacuum deposition of thin films employing one or two linear self-accelerated electron-beam guns was designed and constructed. Commercially available components, modified when necessary, were used possible. An original design was employed for the overall deposition geometry including an 8-stage rotatable water-cooled vapour-source holder and an 8-stage rotatable temperature-controlled substrate-holder. Provision was made for differential pumping on the electron-beam column and automatic pressure control of various blead-in gases in the working chamber.
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